Details |
|
Major capability parameter |
Growth method |
Czochralski method |
Crystal structure |
M3 |
Unit cell constant |
a=5.65754 Å |
Density |
5.323g/cm3 |
Melt point |
937.4℃ |
Doped material |
No doped |
Sb-doped |
In / Ga –doped |
Type |
/ |
N |
P |
Resistivity |
>35Ωcm |
0.05Ωcm |
0.05~0.1Ωcm |
EPD |
<4×103∕cm2 |
<4×103∕cm2 |
<4×103∕cm2 |
Size |
10x3,10x5,10x10,15x15,,20x15,20x20, |
dia2” x 0.33mm dia2” x 0.43mm 15 x 15 mm |
Thickness |
0.5mm,1.0mm |
Polishing |
Single or double |
Crystal orientation |
<100>、<110>、<111>、±0.5º |
Ra: |
≤5Å(5µm×5µm) | |
|
|
|
INQUIRY NOW |
|
|